Maki Arimura

Title: Maki Arimura: Innovator in Copper Etching Technologies

Introduction

Maki Arimura is a notable inventor based in Amagasaki, Japan, recognized for his contributions to the field of copper etching technologies. With a total of four patents to his name, Arimura has made significant advancements that enhance the efficiency and effectiveness of etching processes.

Latest Patents

Arimura's latest patents include an etchant for copper or copper alloys, which comprises 5-50 wt % of an alkanolamine, a copper ion source in the amount of 0.2-10 wt % as copper, a halide ion source in the amount of 0.005-10 wt % as halogen, 0.1-30 wt % of an aliphatic carboxylic acid, and the balance water. This innovative etchant addresses issues such as instability of the liquid composition and unpleasant odor, while also achieving a high etching rate. It exhibits only very slight corrosion even if a small amount of residue is left on the surface and is capable of producing a roughened surface when used for microetching. Another significant patent is a microetching composition for copper or copper alloys, which includes an oxidizing agent, a polymer compound containing polyamine chains or a cationic group, and water. This composition is designed to produce surfaces of copper or copper alloy that exhibit excellent adhesion to resins and superior solderability, making it adaptable for the manufacture of printed wiring boards with highly integrated fine line patterns.

Career Highlights

Maki Arimura is currently employed at Mec Company Ltd., where he continues to develop innovative solutions in the field of etching technologies. His work has been instrumental in advancing the capabilities of copper etching, which is crucial for various applications in electronics and manufacturing.

Collaborations

Arimura collaborates with talented individuals such as Toshiko Nakagawa and Yoshiro Maki, contributing to a dynamic team that drives innovation in their field.

Conclusion

Maki Arimura's contributions to copper etching technologies through his patents and work at Mec Company Ltd. highlight his role as a significant innovator in the industry. His advancements not only improve etching processes but also pave the way for future developments in electronics manufacturing.