Luying Du

Title: **Innovative Contributions of Luying Du in the Field of Integrated Circuit Technology**

Introduction

Luying Du, a prominent inventor based in Singapore, has made significant contributions to the realm of integrated circuits through his innovative work at Globalfoundries Singapore Pte. Ltd. With a total of two patents to his name, Du's inventions focus on enhancing the reliability and efficiency of interconnects and low-k dielectric materials used in integrated circuit systems.

Latest Patents

Luying Du's latest patents include:

1. **Reliable Interconnect Integration Scheme** - This patent details a method for forming reliable interconnects by preparing a substrate with a dielectric layer. The innovative aspect lies in processing the dielectric layer to serve as an intermetal dielectric (IMD) layer, which comprises a hybrid IMD layer containing multiple dielectric materials with varying permittivity (k) values.

2. **Integrated Circuit System Employing Low-k Dielectrics and Method of Manufacture Thereof** - This invention outlines a method for manufacturing an integrated circuit system. It includes steps such as fabricating a substrate that houses an integrated circuit, applying a low-k dielectric layer over it, forming a via and a trench in the low-k layer, conducting a chemical-mechanical planarization (CMP) process to achieve a smooth structure surface, and applying a direct implant to create an implant layer along with a metal passivation layer to repair CMP-induced damage to the low-k dielectric layer.

Career Highlights

Luying Du's tenure at Globalfoundries Singapore Pte. Ltd. has been marked by his dedication to advancing integrated circuit technologies. His meticulous work in improving dielectric materials and fabricating reliable interconnects has positioned him as a key figure in semiconductor innovation. Du’s patents not only reflect his expertise but also his commitment to enhancing the performance of integrated circuits.

Collaborations

Throughout his career, Luying Du has collaborated with esteemed colleagues such as Fan Zhang and Juan Boon Tan. Their combined expertise and insight have undoubtedly contributed to the successful development of groundbreaking technologies and patents in the semiconductor industry.

Conclusion

In conclusion, Luying Du's inventive spirit and technical acumen have led to significant advancements in integrated circuit technologies. His patents address critical issues in the field, ensuring the reliability of interconnects and the use of low-k dielectrics, thereby setting a foundation for future innovations in semiconductor manufacturing.