Richmond, CA, United States of America

Ludmila Shepelev

This inventor holds 2 USPTO granted patents. Top assignees: Mattson Technology Canada, Inc., Mattson Technology, Inc. Active years: 2010-2013.


% Patents Active = 50.0

Average Co-Inventor Count = 14.0

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2010-2013

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2 patents (USPTO):Explore Patents

Title: Ludmila Shepelev: Innovator in Electromagnetic Radiation Technology

Introduction

Ludmila Shepelev is a prominent inventor based in Richmond, CA (US). She has made significant contributions to the field of electromagnetic radiation technology, holding 2 patents that showcase her innovative spirit and technical expertise.

Latest Patents

Her latest patents include "High-intensity electromagnetic radiation apparatus and methods" and "Apparatus and methods for producing electromagnetic radiation." Both patents describe an apparatus designed to produce electromagnetic radiation through a flow generator that generates a flow of liquid along an inside surface of an envelope. The apparatus features first and second electrodes that create an electrical arc within the envelope, producing the desired electromagnetic radiation. Additionally, the design includes an exhaust chamber to accommodate a portion of the liquid flow and a removal device to eliminate particulate contamination released during operation.

Career Highlights

Ludmila has worked with notable companies such as Mattson Technology Canada, Inc. and Mattson Technology, Inc. Her experience in these organizations has allowed her to refine her skills and contribute to advancements in technology.

Collaborations

Some of her coworkers include David Malcolm Camm and Chee Chin, who have collaborated with her on various projects throughout her career.

Conclusion

Ludmila Shepelev's work in electromagnetic radiation technology exemplifies her innovative approach and dedication to advancing the field. Her patents reflect her commitment to developing effective solutions in this area.

Profile summary based on public USPTO records.
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