Lu-Min Liu

Title: Innovations of Lu-Min Liu in Semiconductor Technology

Introduction

Lu-Min Liu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on improving the efficiency and effectiveness of integrated circuit manufacturing processes.

Latest Patents

One of Lu-Min Liu's latest patents is titled "Method for reducing the pattern sensitivity of ozone assisted chemical." This patent describes a method for forming an ozone-assisted Chemical Vapor Deposited (CVD) silicon oxide insulator layer that has diminished pattern sensitivity. The process begins with a semiconductor substrate, upon which a patterned layer is formed. This patterned layer is susceptible to modification with plasma, which reduces the pattern sensitivity of the CVD silicon oxide insulator layer. The ozone-assisted CVD silicon oxide insulator layer is then formed upon the treated patterned layer. Additionally, a conformal insulator layer may be formed prior to the CVD process, which can also be treated with a second plasma.

Another notable patent is the "Method of making an underlayer to reduce pattern sensitivity." This patent outlines an improved method of ozone-TEOS deposition that enhances gap filling capability while reducing pattern sensitivity. The process involves depositing a conducting layer over semiconductor device structures and patterning it to form conducting lines. A nucleation layer is then created, followed by the deposition of oxide layers that fill the gaps between the conducting lines, ultimately completing the fabrication of the integrated circuit.

Career Highlights

Lu-Min Liu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in semiconductor manufacturing techniques. His work has been instrumental in advancing the capabilities of integrated circuits, making them more efficient and reliable.

Collaborations

Lu-Min Liu has collaborated with notable colleagues, including Syun-Ming Jang and Chin-Kun Wang. These collaborations have further enriched his research and development efforts in the semiconductor field.

Conclusion

Lu-Min Liu's contributions to semiconductor technology through his innovative patents have significantly impacted the industry. His work continues to pave the way for advancements in integrated circuit manufacturing processes.