Location History:
- San Jose, CA (US) (2003 - 2004)
- Redwood City, CA (US) (2004)
- Menlo Park, CA (US) (2002 - 2006)
Company Filing History:
Years Active: 2002-2006
Title: Innovations of Louis N Koppel
Introduction
Louis N Koppel is a notable inventor based in Menlo Park, California. He has made significant contributions to the field of X-ray reflectometry, holding a total of seven patents. His work focuses on enhancing the accuracy and efficiency of X-ray measurement systems, which are crucial in various scientific and industrial applications.
Latest Patents
One of Koppel's latest patents involves the calibration and alignment of X-ray reflectometric systems. This patent presents an innovative approach for accurately determining the calibration factor for each sample placement. It also details how to find the incident X-ray intensity corresponding to each pixel of a detector array, allowing for an effective amplitude calibration of the reflectometer system. Another significant patent introduces a detector-shield assembly for X-ray reflectometric systems. This assembly provides shielding for vulnerable regions of an X-ray detector against both directly impinging and scattered X-rays. The design includes a primary aperture to shape the X-ray beam and a secondary aperture to shield off scattering X-rays, enhancing the overall performance of the detector.
Career Highlights
Throughout his career, Koppel has worked with prominent companies such as Therma-Wave, Inc. and KLA-Tencor Technologies Corporation. His experience in these organizations has contributed to his expertise in the field of X-ray technology and reflectometry.
Collaborations
Koppel has collaborated with notable professionals in his field, including Craig E Uhrich and Jon Opsal. These collaborations have likely enriched his work and led to further advancements in X-ray reflectometry.
Conclusion
Louis N Koppel's contributions to the field of X-ray reflectometry through his innovative patents and collaborations highlight his significant role as an inventor. His work continues to influence advancements in measurement technologies.