The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2006
Filed:
Jun. 04, 2004
Louis N. Koppel, Menlo Park, CA (US);
Craig E. Uhrich, Redwood City, CA (US);
Jon Opsal, Livermore, CA (US);
Louis N. Koppel, Menlo Park, CA (US);
Craig E. Uhrich, Redwood City, CA (US);
Jon Opsal, Livermore, CA (US);
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
In the calibration and alignment of an X-ray reflectometry ('XRR') system for measuring thin films, an approach is presented for accurately determining Cfor each sample placement and for finding the incident X-ray intensity corresponding to each pixel of a detector array and thus permitting an amplitude calibration of the reflectometer system. Another approach involves aligning an angle-resolved X-ray reflectometer using a focusing optic, such as a Johansson crystal. Another approach relates to validating the focusing optic. Another approach relates to the alignment of the focusing optic with the X-ray source. Another approach concerns the correction of measurements errors caused by the tilt or slope of the sample. Yet another approach concerns the calibration of the vertical position of the sample.