Lina Shi

Title: Innovations of Inventor Lina Shi in Extreme Ultraviolet Lithography

Introduction

Lina Shi, an accomplished inventor based in Beijing, China, has made significant contributions to the field of extreme ultraviolet lithography. With a total of three patents to her name, her innovations are poised to have a profound impact on the semiconductor manufacturing industry.

Latest Patents

Lina Shi's latest patents include a sophisticated **defect detection system for extreme ultraviolet lithography masks**. This system comprises components such as an extreme ultraviolet light source and transmission parts, an extreme ultraviolet lithography mask, a photon sieve, and a collection and analysis system. The innovative aspect of this system is its use of the photon sieve to replace the traditional Schwarzchild objective, which not only reduces costs but also achieves high resolution in detecting defects.

Another noteworthy patent is her **sub-wavelength extreme ultraviolet metal transmission grating and the method for its manufacturing**. This method involves developing a silicon nitride self-supporting film on a silicon-based substrate and utilizing a series of sophisticated steps including electron beam direct writing and magnetron sputtering to create precise grating line patterns. This technique highlights her innovative approach to enhancing the capabilities of extreme ultraviolet lithography.

Career Highlights

Lina Shi is affiliated with the Chinese Academy of Sciences, where she continues to push the boundaries in research and development. Her career is marked by her dedication to advancing lithography technology, significantly contributing to the efficiency and precision required in modern semiconductor manufacturing.

Collaborations

Throughout her career, Lina has collaborated with talented professionals such as Hailiang Li and Changqing Xie. These collaborations have enriched her work and fostered an environment of innovation and creative problem-solving.

Conclusion

Lina Shi's innovative patents and collaborative spirit underscore her vital role in the advancement of extreme ultraviolet lithography technology. Her contributions are set to influence the future of the semiconductor industry, paving the way for more efficient and cost-effective manufacturing processes.