Austin, TX, United States of America

Lie Larry Zhao


Average Co-Inventor Count = 8.0

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2002-2010

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3 patents (USPTO):

Title: The Innovative Journey of Inventor Lie Larry Zhao

Introduction

Lie Larry Zhao, an accomplished inventor based in Austin, Texas, has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, Zhao's work reflects a commitment to advancing innovations that shape the future of electronic devices.

Latest Patents

Among his notable patents, Zhao's latest invention focuses on the "Resist Trim Process to Define Small Openings in Dielectric Layers." This innovative method is designed to enhance the fabrication of semiconductor devices. One illustrative embodiment involves defining a photoresist feature of a specific size above a dielectric material layer. The process then entails reducing the photoresist feature size, subsequently forming an opening in the dielectric layer beneath it, and ultimately depositing a conductive material within that opening. This innovation holds great promise for improving the efficiency and performance of semiconductor manufacturing.

Career Highlights

Throughout his career, Lie Larry Zhao has garnered experience at prominent companies, including Advanced Micro Devices Corporation and GlobalFoundries Inc. His work in these organizations has been central to advancing semiconductor technologies and ensuring that the innovations he contributes to remain at the cutting edge of the industry.

Collaborations

Zhao's journey in innovation has not been solitary. He has had the pleasure of working alongside talented colleagues such as Srikanteswara Dakshina-Murthy and Paul Raymond Besser. These collaborations have undoubtedly enriched his professional experience and fostered a fertile environment for groundbreaking developments in semiconductor design and application.

Conclusion

In summary, Lie Larry Zhao's work illustrates the essence of innovation in the semiconductor field. With his patented methodologies and collaborative spirit, he continues to influence the landscape of electronic device manufacturing. As technology evolves, Zhao’s contributions will likely play an integral role in shaping future advancements.

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