Lianhong Wang

Title: Lianhong Wang: Innovator in Capacitor Technology

Introduction

Lianhong Wang is a prominent inventor based in Hefei, China. He has made significant contributions to the field of capacitor technology, holding a total of 3 patents. His innovative work focuses on improving the efficiency and performance of capacitor structures.

Latest Patents

Wang's latest patents include a preparation method for capacitor structures, a capacitor structure, and a memory device. The preparation method involves forming a dielectric layer on a first electrode, which consists of a first amorphous layer and a high dielectric constant layer stacked together. The first amorphous layer maintains its structure after annealing, while the high dielectric constant layer is formed by crystallizing an initial dielectric constant layer post-annealing. This design effectively suppresses electron transport, thereby reducing the leakage current of the capacitor structure. Another patent details a capacitor structure that includes two oppositely arranged electrodes and a dielectric layer with at least two stacked perovskite layers, with an amorphous layer positioned between each pair of adjacent perovskite layers.

Career Highlights

Lianhong Wang is currently employed at Changxin Memory Technologies, Inc., where he continues to advance his research and development in capacitor technology. His work has garnered attention for its potential applications in various electronic devices.

Collaborations

Wang collaborates with notable colleagues, including Xingsong Su and Weiping Bai, who contribute to his innovative projects and research endeavors.

Conclusion

Lianhong Wang's contributions to capacitor technology exemplify his dedication to innovation in the field. His patents reflect a commitment to enhancing the performance and efficiency of electronic components.