The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Aug. 09, 2021
Applicant:

Changxin Memory Technologies, Inc., Hefei, CN;

Inventors:

Xingsong Su, Hefei, CN;

Weiping Bai, Hefei, CN;

Mengkang Yu, Hefei, CN;

Lianhong Wang, Hefei, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H10B 12/00 (2023.01); H10D 1/00 (2025.01); H10D 1/68 (2025.01);
U.S. Cl.
CPC ...
H01L 21/02356 (2013.01); H01L 21/02148 (2013.01); H01L 21/02159 (2013.01); H01L 21/02194 (2013.01); H10B 12/03 (2023.02); H10B 12/30 (2023.02); H10D 1/042 (2025.01); H10D 1/68 (2025.01); H10D 1/716 (2025.01); H10D 1/684 (2025.01);
Abstract

A preparation method for the capacitor structure includes: forming a dielectric layer on a first electrode, wherein, the dielectric layer includes a first amorphous layer and a high dielectric constant layer which are stacked, the first amorphous layer maintaining an amorphous structure after annealing, and the high dielectric constant layer being formed by crystallizing an initial dielectric constant layer after annealing; and forming a second electrode on the dielectric layer. Since the first amorphous layer remains an amorphous structure after annealing, electron transport can be suppressed, thereby reducing the leakage current of the capacitor structure.


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