Liang-Hsiang Chen

Title: The Innovations of Liang-Hsiang Chen

Introduction

Liang-Hsiang Chen is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of nine patents. His work has advanced the development of various semiconductor devices and thin-film technologies.

Latest Patents

One of his latest patents is a semiconductor device having a resistor. This invention discloses a method of forming a semiconductor device that includes creating a plurality of isolation regions on a semiconductor substrate. The method also involves forming a protective layer in a resistor region, etching a gate dielectric layer, and forming dummy gate stacks. Another notable patent is for a thin-film device, which may include a carrier, a release layer, a stacking structure, and a flexible substrate. The design of this device emphasizes the refractive index differences between protective layers, enhancing its functionality.

Career Highlights

Liang-Hsiang Chen has worked with esteemed organizations such as the Industrial Technology Research Institute and Taiwan Semiconductor Manufacturing Company. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Throughout his career, Liang-Hsiang Chen has collaborated with notable colleagues, including Jing-Yi Yan and Ming-Chou Chen. These partnerships have fostered a creative environment that has led to significant advancements in their respective fields.

Conclusion

Liang-Hsiang Chen's contributions to semiconductor technology and his innovative patents highlight his role as a leading inventor in the industry. His work continues to influence the development of advanced electronic devices.