Lian Lu

Title: Lian Lu: Innovator in Semiconductor Technology

Introduction

Lian Lu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced fabrication methods for silicon-on-insulator devices. With a total of 3 patents to his name, Lian Lu continues to push the boundaries of innovation in his field.

Latest Patents

Lian Lu's latest patents include a method for fabricating fully depleted silicon-on-insulator PMOS devices. This method involves sequentially forming a polysilicon layer and a hard mask oxide layer on an FDSOI substrate structure. It also includes etching to a SiGe layer using the hard mask oxide layer as a mask to form a PMOS gate stack structure. The process aims to effectively reduce the accumulative loss of a SiGe substrate after the epitaxial hard mask etching, thereby improving the performance of the fabricated devices.

Another notable patent is a method for making silicon epitaxy of a FDSOI device. This method encompasses several steps, including providing a semiconductor structure and forming a first etch stop layer and an etch reaction layer on its surface. The process allows for the epitaxial growth of silicon, ensuring that the epitaxial silicon is flush with the top silicon layer.

Career Highlights

Lian Lu is currently employed at Shanghai Huali Integrated Circuit Corporation, where he applies his expertise in semiconductor fabrication. His work has been instrumental in advancing the company's technological capabilities and product offerings.

Collaborations

Lian Lu collaborates with talented individuals in his field, including Xiangguo Meng and Yizheng Zhu. Their combined efforts contribute to the innovative projects at Shanghai Huali Integrated Circuit Corporation.

Conclusion

Lian Lu is a key figure in semiconductor innovation, with a focus on enhancing the performance of silicon-on-insulator devices. His patents reflect a commitment to advancing technology and improving fabrication methods. Through his work, he continues to make a significant impact in the field of semiconductor technology.