Location History:
- Taipei, TW (2014)
- Hsinchu, TW (1993 - 2016)
Company Filing History:
4 out of 1,198 
2 out of 9,157 
Years Active: 1993-2016
Title: Innovations by Inventor Li Yuan Chang
Introduction
Li Yuan Chang, an innovative inventor based in Taipei, Taiwan, has made significant contributions to the field of materials science through his patented inventions. With a total of six patents to his name, Li Yuan Chang has focused on advancing methods in semiconductor and diamond film technologies.
Latest Patents
Among his latest innovations is a groundbreaking **method for growing aluminum indium nitride films on silicon substrates**. This method enhances the quality of the films by directly forming an AlInN layer on the silicon substrate. This approach increases lattice matching, reduces residual thermal stress, and simplifies the fabrication process, leading to a reduction in costs.
Another notable patent is his **method for growing epitaxial diamond**. In this process, a metallic layer is first deposited on a diamond substrate, followed by the deposition of an epitaxial diamond film. The metallic layer serves as a buffer, alleviating the stress that can accumulate in the thin film of the epitaxial diamond, thereby preventing cracks and ensuring high-quality layers.
Career Highlights
Li Yuan Chang has held notable positions at respected institutions such as National Chiao Tung University and the Industrial Technology Research Institute. His work in these organizations has not only propelled his research but also contributed significantly to advancements in his field.
Collaborations
Throughout his career, Li has collaborated with talented individuals in his field, including Jr-Yu Chen and Ya Chung Yu, who have played essential roles in furthering his research endeavors. These collaborations have enhanced the innovation process, facilitating the development of advanced methodologies in material sciences.
Conclusion
Li Yuan Chang's contributions to the field of technology are notable and impactful, showcasing his dedication to innovation. With his recent patents and robust career, he continues to inspire future advancements in semiconductor and diamond technologies, paving the way for new possibilities in materials science.