The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Jul. 29, 2013
Applicant:
National Chiao Tung University, Hsinchu, TW;
Inventors:
Assignee:
NATIONAL CHIAO TUNG UNIVERSITY, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 29/04 (2006.01); C30B 25/18 (2006.01); C30B 25/06 (2006.01); C30B 25/10 (2006.01);
U.S. Cl.
CPC ...
C30B 25/183 (2013.01); C30B 25/06 (2013.01); C30B 25/10 (2013.01); C30B 25/105 (2013.01); C30B 25/186 (2013.01); C30B 29/04 (2013.01);
Abstract
The present invention is directed to a method of growing thin film diamond. Since there are micro-grooves formed between internal grains of the heterogeneous substrate during lateral epitaxy growth, diamond seeds are allowed to be embedded in the micro-grooves; surface damage caused by scratching method or seeding method also can be prevented. As a result, a continuous diamond thin film with uniform thickness and high quality can be obtained.