Li Wang

Title: Innovations of Inventor Li Wang

Introduction

Li Wang is a notable inventor based in San Ramon, California. He has made significant contributions to the field of extreme ultraviolet (EUV) technology, holding three patents that showcase his expertise and innovative spirit. His work primarily focuses on enhancing the efficiency and effectiveness of EUV mask inspection and lithography systems.

Latest Patents

Li Wang's latest patents include groundbreaking technologies such as "Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems." This patent describes photoelectron emission mapping systems that are utilized for EUV photolithography masks and mirrors. The systems leverage EUV photoelectron sources to generate photoelectrons on the surfaces of masks and mirrors, which are then collected and analyzed by detectors positioned away from the optical spaces of the EUV chamber. Another significant patent is "Spectral purity filter and light monitor for an EUV reticle inspection system." This invention outlines an EUV mask inspection system that incorporates a light source, an illumination system with a spectral purity filter, and multiple detector arrays to enhance the accuracy of mask inspections.

Career Highlights

Li Wang is currently employed at Kla Tencor Corporation, where he continues to push the boundaries of EUV technology. His work has been instrumental in advancing the capabilities of mask inspection systems, which are critical for the semiconductor manufacturing process. His innovative approaches have garnered attention within the industry, establishing him as a key figure in the field.

Collaborations

Throughout his career, Li Wang has collaborated with talented individuals such as Daimian Wang and Yanwei Liu. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Li Wang's contributions to the field of EUV technology through his patents and work at Kla Tencor Corporation highlight his role as an influential inventor. His innovative solutions are paving the way for advancements in semiconductor manufacturing and mask inspection systems.