Boise, ID, United States of America

Leland R Nevill

This inventor holds 58 USPTO granted patents, primarily in Integrated Circuit Testing (CPC class 3652). Top assignees: Micron Technology Incorporated, Other. Active years: 1989-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Leland R Nevill. Retrieved from https://idiyas.com/inventor/leland-r-nevill

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 79.3

Average Co-Inventor Count = 3.0

ph-index = 21

Forward Citations = 1,213(Granted Patents)

Forward Citations (Not Self Cited) = 1,163(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:


Years Active: 1989-2016

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Areas of Expertise:
Error Detection
Memory Management
Integrated Circuit
Data Compression
Testing Method
Semiconductor Wafer
Isolation Technique
Self-Test Circuit
Alignment Feature
Reduced Terminal Testing
Surge Capacitors
Burn-In Testing
58 patents (USPTO):Explore Patents

Title: The Innovative Journey of Leland R Nevill

Introduction: Leland R Nevill, a pioneering inventor based in Boise, ID, has made significant contributions to the field of technology with his inventive spirit and dedication to innovation.

Latest Patents: Leland R Nevill holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to complex problems.

Career Highlights: Throughout his illustrious career, Leland R Nevill has been at the forefront of technological advancements, leading groundbreaking projects and pushing the boundaries of innovation.

Collaborations: Leland R Nevill has collaborated with top research institutions, leading companies, and brilliant minds in the industry, fostering a culture of innovation and knowledge sharing.

Conclusion: In conclusion, Leland R Nevill's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of inventors, leaving a lasting impact on the technological landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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