Lawrence N Brigham

Title: The Innovations of Lawrence N Brigham

Introduction

Lawrence N Brigham is a prominent inventor based in Beaverton, OR (US). He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work primarily focuses on advancements in transistor design and fabrication methods.

Latest Patents

One of his latest patents is for a "Transistor having a deposited dual-layer spacer structure." This invention involves a transistor that comprises a deposited dual-layer spacer structure and a method of fabrication. The process includes depositing a polysilicon layer over a gate dielectric, which is then etched to form the polysilicon gate electrode. Following this, oxide is deposited over the surface of the gate electrode, and a second dielectric layer is added. Spacers are formed adjacent to the gate electrode by etching back the second dielectric layer using a substantially anisotropic etch, which etches the second dielectric layer faster than the oxide. Another notable patent is for a "Polysilicon/amorphous silicon composite gate electrode." This invention provides a polysilicon/amorphous silicon composite layer that improves linewidth control in the patterning of gate electrodes during the manufacture of metal oxide semiconductor (MOS) devices. The formation of this composite gate enhances the electrical performance and doping qualities of a polysilicon gate while also providing the smoothness of an amorphous silicon gate, which improves line definition during gate patterning.

Career Highlights

Lawrence N Brigham has had a distinguished career at Intel Corporation, where he has been instrumental in developing innovative semiconductor technologies. His expertise in transistor design has positioned him as a key figure in the advancement of integrated circuits.

Collaborations

Throughout his career, Brigham has collaborated with notable colleagues, including Robert S Chau and Chia-Hong Jan. These partnerships have fostered a collaborative environment that has led to significant technological advancements.

Conclusion

Lawrence N Brigham's contributions to the field of semiconductor technology are noteworthy. His innovative patents and collaborative efforts at Intel Corporation have significantly impacted the industry. His work continues to influence the future of transistor design and fabrication methods.