Hsinchu, Taiwan

Lawrance Sheu

This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2010-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lawrance Sheu. Retrieved from https://idiyas.com/inventor/lawrance-sheu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 16.7

Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2010-2014

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6 patents (USPTO):Explore Patents

Title: Lawrance Sheu: A Pioneer in PVD Technology

Introduction

Lawrance Sheu is a notable inventor based in Hsinchu, Taiwan, with a remarkable portfolio that includes six patents. His innovative contributions primarily focus on enhancing physical vapor deposition (PVD) technologies, particularly in improving the reliability and efficiency of PVD targets.

Latest Patents

Among Lawrance's recent patents is the "PVD Target with End of Service Life Detection Capability." This invention revolutionizes PVD target structures by integrating consumable slabs of source material with detectors that prompt users when the slab is nearing its service lifetime endpoint. His patent also describes a method for creating a tube-based detector that signals when the PVD target material has diminished to a predetermined quantity. It involves a detailed process of forming a tube from molten material, which is embedded within the PVD target, enhancing monitoring capabilities for users.

Career Highlights

Currently, Lawrance Sheu is an integral part of Taiwan Semiconductor Manufacturing Company Limited (TSMC), where he applies his expertise in semiconductor manufacturing technologies. His six patents underline his commitment to innovation and improvement in PVD processes.

Collaborations

Throughout his career, Lawrance has collaborated with esteemed colleagues, including Yi-Li Hsiao and Chen-Hua Douglas Yu. Their joint efforts have contributed significantly to the advancement of PVD technologies, showcasing the importance of teamwork in driving innovation.

Conclusion

With a solid foundation in semiconductor manufacturing and a keen eye for improvements in PVD technology, Lawrance Sheu continues to make strides in his field. His inventive spirit and patented works promise to pave the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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