The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Sep. 22, 2006
Ying-lin Chen, Tainan County, TW;
Chi-an Kao, Tainan, TW;
Po-zen Chen, Kaohsiung, TW;
Yi-li Hsiao, Hsinchu, TW;
Chen-hua Yu, Hsinchu, TW;
Jean Wang, Hsinchu, TW;
Lawrance Sheu, Hsinchu, TW;
Ying-Lin Chen, Tainan County, TW;
Chi-An Kao, Tainan, TW;
Po-Zen Chen, Kaohsiung, TW;
Yi-Li Hsiao, Hsinchu, TW;
Chen-Hua Yu, Hsinchu, TW;
Jean Wang, Hsinchu, TW;
Lawrance Sheu, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A adjustable upper coil or electrode for a reaction chamber apparatus useable in semiconductor processing, is constructed so that its shape may be selectively changed or so at least two portions thereof may be selectively driven at different power and/or frequencies. The adjustable upper coil or electrode, therefore, enables the plasma density distribution in the reaction chamber apparatus to be selectively controlled.