Cupertino, CA, United States of America

Laurence H Cooke

This inventor holds 2 USPTO granted patents. Top assignee: Fujitsu Corporation. Active years: 1979.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Laurence H Cooke. Retrieved from https://idiyas.com/inventor/laurence-h-cooke-xe8mw9z3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 1979

Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovations of Laurence H. Cooke

Introduction

Laurence H. Cooke is a notable inventor based in Cupertino, CA, recognized for his contributions to the field of electron beam exposure systems. With a total of 2 patents, his work has significantly impacted the fabrication of microminiature devices and semiconductor technology.

Latest Patents

One of Cooke's latest patents is the "Electron beam exposure system method and apparatus." This invention provides a high-speed method for fabricating microminiature devices. The system utilizes a computer to deliver programmed commands that specify the patterns to be scanned. A processor generates scan data line by line, allowing precise control of the electron beam's position. This innovation eliminates unnecessary scanning areas, enhancing efficiency.

Another significant patent is the "Overlapping boundary electron exposure system method and apparatus." This invention addresses the challenges of fabricating semiconductor devices by dividing a chip pattern larger than the electron beam scan field into smaller parts, known as partitions. The workpiece is moved relative to the scan field, enabling each partition to be scanned individually. This method minimizes divisions along critical dimensions, ensuring a seamless fabrication process.

Career Highlights

Laurence H. Cooke has made substantial contributions to the field of electron beam technology during his career at Fujitsu Corporation. His innovative approaches have paved the way for advancements in semiconductor manufacturing and microminiature device fabrication.

Collaborations

Throughout his career, Cooke has collaborated with esteemed colleagues, including Fred K. Buelow and John J. Zasio. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Laurence H. Cooke's work in electron beam exposure systems exemplifies the spirit of innovation in technology. His patents reflect a commitment to advancing the field of semiconductor fabrication, making him a significant figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…