The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 1979

Filed:

Nov. 01, 1977
Applicant:
Inventors:

Fred K Buelow, Los Altos Hills, CA (US);

John J Zasio, Sunnyvale, CA (US);

Laurence H Cooke, Cupertino, CA (US);

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K / ;
U.S. Cl.
CPC ...
2504 / ;
Abstract

An electron beam exposure system and method for use in the process of fabricating microminiature devices at high speeds. The high-speed operation is achieved with a computer providing programmed commands specifying a particular pattern to be scanned. A processor, responsive to programmed data, generates scan data a line at a time and loads a line generator. The line generator steps to each exposure location in a line to provide control signals for controlling the position of the electron beam. The starting and end positions of scan lines in both the X and Y directions may be arbitrarily selected thereby eliminating the need for scanning areas not intended to be processed.


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