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For the Inventor, By the Inventor

Sungnam, South Korea

Kyoung-sub Shin

USPTO Granted Patents = 10

Average Co-Inventor Count = 3.0

ph-index = 4

Forward Citations = 50(Granted Patents)


Location History:

  • Kyungki-do, KR (1999)
  • Seongnam, KR (2002 - 2006)
  • Sungnam, KR (2002 - 2007)

Company Filing History:

goldMedal10 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 1999-2007

where 'Filed Patents' based on already Granted Patents

10 patents (USPTO):
1. 7265051 - Semiconductor memory device and method of manufacturing the same (2007-09-04),
2. 7145140 - Method of determining whether a conductive layer of a semiconductor device is exposed through a contact hold (2006-12-05),
3. 6974986 - Semiconductor memory device and method of manufacturing the same (2005-12-13),
4. 6777341 - Method of forming a self-aligned contact, and method of fabricating a semiconductor device having a self-aligned contact (2004-08-17),
5. 6657192 - Method of determining degree of charge-up induced by plasma used for manufacturing semiconductor device and apparatus therefor (2003-12-02),
6. 6545306 - Semiconductor memory device with a connector for a lower electrode or a bit line (2003-04-08),
7. 6350642 - Method of manufacturing semiconductor memory device including various contact studs (2002-02-26),
8. 6348375 - Method of fabricating a bit line structure for a semiconductor device (2002-02-19),
9. 6342416 - Method of manufacturing a semiconductor memory device (2002-01-29),
10. 5885756 - Methods of patterning a semiconductor wafer having an active region and (1999-03-23),

Title: Kyoung-sub Shin: Innovator in Semiconductor Technology

Introduction

Kyoung-sub Shin is a prominent inventor based in Sungnam, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on enhancing the efficiency and functionality of semiconductor devices.

Latest Patents

One of Kyoung-sub Shin's latest patents is a semiconductor memory device and method of manufacturing the same. This invention includes a bit line connector and a lower electrode connector that connect a bit line and a capacitor lower electrode of the device to active areas of a semiconductor substrate. The connectors are formed using a line-type self-aligned photoresist mask pattern positioned on an interlevel dielectric layer, which exposes only a portion of the dielectric layer corresponding to a source region. This innovative approach provides a misalignment margin and simplifies the manufacturing process.

Another notable patent involves a method of determining whether a conductive layer of a semiconductor device is exposed through a contact hole. This method utilizes a primary electron beam to scan a predetermined region on a wafer surface that has undergone a plasma process. By collecting secondary electrons generated from this interaction, the degree of charge-up induced by the plasma can be determined. This technology aids in assessing whether a contact hole is opened or the extent of degradation of a gate insulating layer.

Career Highlights

Kyoung-sub Shin is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to push the boundaries of semiconductor technology and contribute to advancements in the field.

Collaborations

Throughout his career, Kyoung-sub Shin has collaborated with talented individuals such as Ji-Soo Kim and Jeong-seok Kim. These collaborations have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Kyoung-sub Shin is a distinguished inventor whose work in semiconductor technology has led to significant advancements. His innovative patents and contributions to Samsung Electronics Co., Ltd. highlight his expertise and commitment to the field.

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