Location History:
- Takaoka, JP (2006)
- Toyama, JP (2007 - 2010)
- Kyoto, JP (1999 - 2011)
Company Filing History:
6 out of 27,375 
3 out of 16,453 
1 out of 655 
Years Active: 1999-2011
Title: Kyoko Egashira: Innovator in Semiconductor Technology
Introduction
Kyoko Egashira is a prominent inventor based in Toyama, Japan. She has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. Her work has been instrumental in advancing manufacturing methods for semiconductor devices.
Latest Patents
One of her latest patents is titled "Method for manufacturing semiconductor device using multiple ion implantation masks." This production method involves providing a semiconductor substrate with a semiconductor layer of a first conductivity type. It includes forming a first mask to cover a predetermined region of the semiconductor layer, implanting impurity ions to create a well region of a second conductivity type, and subsequently forming a source region of the first conductivity type. Another notable patent is "Semiconductor device and method for fabricating the same," which describes a semiconductor device composed of an interconnect made of stacked conductive films and a capacitor with a lower electrode, dielectric film, and upper electrode.
Career Highlights
Kyoko has worked with renowned companies such as Matsushita Electric Industrial Co., Ltd. and Panasonic Corporation. Her experience in these organizations has allowed her to develop innovative solutions in semiconductor technology.
Collaborations
Throughout her career, Kyoko has collaborated with notable colleagues, including Shin Hashimoto and Takenobu Kishida. These partnerships have contributed to her success and the advancement of her inventions.
Conclusion
Kyoko Egashira's contributions to semiconductor technology through her patents and collaborations highlight her role as a leading inventor in the field. Her innovative methods continue to influence the industry and pave the way for future advancements.