Kyo Otsubo

Title: Kyo Otsubo: Innovator in Substrate Cleaning Technologies

Introduction

Kyo Otsubo is a prominent inventor based in Shinagawa, Tokyo, Japan. He has made significant contributions to the field of substrate cleaning technologies, holding a total of 6 patents. His innovative methods have advanced the efficiency and effectiveness of cleaning processes in various applications.

Latest Patents

Otsubo's latest patents include a "Method for cleaning substrate and cleaning device." This invention involves supplying a liquid onto a substrate, solidifying the liquid to form a solidified body, and subsequently melting the solidified body. A unique aspect of this method is the variation of internal pressure during the solidification process. Another notable patent is the "Method for cleaning substrate and substrate processing apparatus." This method consists of a two-step cleaning process, where the substrate undergoes a first cleaning method, followed by a second cleaning method that differs from the first. The first method may involve acidic or alkaline cleaning, while the second method utilizes freeze cleaning.

Career Highlights

Throughout his career, Kyo Otsubo has worked with leading companies in the technology sector, including Toshiba Memory Corporation and Kioxia Corporation. His experience in these organizations has allowed him to develop and refine his innovative cleaning technologies.

Collaborations

Otsubo has collaborated with notable colleagues such as Minako Inukai and Hideaki Sakurai. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Kyo Otsubo's contributions to substrate cleaning technologies demonstrate his innovative spirit and commitment to advancing the field. His patents reflect a deep understanding of the complexities involved in cleaning processes, making him a valuable figure in the industry.