The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2022
Filed:
May. 18, 2020
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventors:
Kyo Otsubo, Shinagawa Tokyo, JP;
Hideaki Sakurai, Kawasaki Kanagawa, JP;
Minako Inukai, Yokohama Kanagawa, JP;
Assignee:
KIOXIA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 3/04 (2006.01); B08B 3/08 (2006.01); B08B 7/00 (2006.01); B08B 7/04 (2006.01); H01L 21/67 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02101 (2013.01); B08B 3/041 (2013.01); B08B 3/08 (2013.01); B08B 7/0014 (2013.01); B08B 7/0092 (2013.01); B08B 7/04 (2013.01); G03F 7/0002 (2013.01); H01L 21/67051 (2013.01);
Abstract
According to one embodiment, a method for cleaning a substrate includes first cleaning process and second cleaning process. The first cleaning process subjects a substrate to a first cleaning method. The second cleaning process subjects the substrate to a second cleaning method that is different from the first cleaning method and is subsequent to the first cleaning process. The first cleaning method includes at least one of acidic cleaning or alkaline cleaning. The second cleaning method includes freeze cleaning.