Kwee Liang Yeo

Title: Kwee Liang Yeo: Innovator in Semiconductor Technology

Introduction

Kwee Liang Yeo is a prominent inventor based in Singapore, known for his contributions to semiconductor technology. He has been awarded 2 patents that showcase his innovative approaches in the field. His work focuses on enhancing the reliability and efficiency of semiconductor devices.

Latest Patents

One of Kwee Liang Yeo's latest patents is titled "Filament Free Silicide Formation." This patent discloses a device and methods for forming the device, which includes providing a substrate and forming a gate with a gate electrode and sidewall spacers. The method ensures that the height of the gate is lower than that of the sidewall spacers, preventing the formation of metal silicide filaments on top of the sidewall spacers. Another significant patent is "Reliable Interconnect for Semiconductor Device." This patent describes semiconductor devices and methods of making them, including a substrate with a first dielectric layer and multiple via contacts that do not extend beyond the underlying contact regions.

Career Highlights

Kwee Liang Yeo is currently employed at GlobalFoundries Singapore Pte. Ltd., where he continues to push the boundaries of semiconductor technology. His work has significantly impacted the development of reliable interconnects in semiconductor devices.

Collaborations

Throughout his career, Kwee Liang Yeo has collaborated with notable colleagues, including Zhehui Wang and Hai Cong. These collaborations have contributed to the advancement of innovative solutions in the semiconductor industry.

Conclusion

Kwee Liang Yeo's contributions to semiconductor technology through his patents and work at GlobalFoundries Singapore Pte. Ltd. highlight his role as a key innovator in the field. His inventions continue to influence the development of more efficient and reliable semiconductor devices.