Kuowei Liu

Title: Innovations of Kuowei Liu in Dielectric Materials

Introduction

Kuowei Liu is a prominent inventor based in Santa Clara, CA, known for his significant contributions to the field of dielectric materials. With a total of 18 patents to his name, Liu has made remarkable advancements that enhance the performance of electronic devices.

Latest Patents

One of Liu's latest patents is focused on a low dielectric constant film produced from silicon compounds comprising silicon-carbon bonds. This invention details a method and apparatus for depositing a low dielectric constant film through the reaction of an organo silane compound and an oxidizing gas. The resulting oxidized organo silane film exhibits excellent barrier properties, making it suitable for use as a liner or cap layer adjacent to other dielectric layers. Additionally, this film can serve as an etch stop or an intermetal dielectric layer for fabricating dual damascene structures, providing excellent adhesion between different dielectric layers. Another notable patent involves integrated low k dielectrics and etch stops, which describes a method of depositing and etching dielectric layers with low dielectric constants and varying etch rates. This innovation allows for the formation of horizontal interconnects and the creation of dual damascene structures with dielectric constants lower than about 4.

Career Highlights

Kuowei Liu is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on developing advanced materials that improve the efficiency and performance of electronic components. Liu's expertise in dielectric materials has positioned him as a key figure in the ongoing evolution of semiconductor technology.

Collaborations

Throughout his career, Liu has collaborated with notable colleagues, including Wai-Fan Yau and David Wingto Cheung. These partnerships have contributed to the successful development of innovative technologies in the field.

Conclusion

Kuowei Liu's contributions to the field of dielectric materials through his patents and work at Applied Materials, Inc. highlight his role as a leading inventor in the semiconductor industry. His innovations continue to shape the future of electronic devices and materials.