Kuo-Pin Chuang

Title: Innovations by Kuo-Pin Chuang: Pioneering Sputter Target Magnet Technology

Introduction: Kuo-Pin Chuang, an accomplished inventor from Xinfeng, China, has made significant contributions to the field of semiconductor manufacturing. With a total of three patents to his name, he has demonstrated a strong commitment to enhancing technological processes.

Latest Patents: One of Kuo-Pin Chuang's latest patents is centered around a method for modifying magnetic field distribution in a deposition chamber, specifically titled “Sputter target magnet.” This inventive methodology involves several critical steps: providing a target magnetic field distribution, removing a first plurality of fixed magnets within the deposition chamber, and replacing those magnets with a second plurality. The process further includes adjustments to the position, size, and magnetic flux of the second plurality of magnets. Importantly, the magnetic field distribution is measured and compared with the target distribution to ensure optimal performance.

Career Highlights: Kuo-Pin Chuang has been actively engaged in his career at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm known for its cutting-edge innovation in semiconductor technology. His work has not only been pivotal for the company but also for advancing the overall industry standards in magnetic field applications within deposition technologies.

Collaborations: Throughout his career, Kuo-Pin Chuang has collaborated with esteemed colleagues such as Shuen-Liang Tseng and Chen-Fang Chung. Together, they have pushed the boundaries of semiconductor processes, contributing to the development of more efficient and effective manufacturing techniques.

Conclusion: Kuo-Pin Chuang stands as a testament to the importance of innovation in the semiconductor industry. His latest patent, focusing on sputter target magnet technology, showcases his ability to enhance existing methods and support the evolution of manufacturing practices.