The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2022
Filed:
Mar. 29, 2018
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Ming-Jie He, Hsin-Chu, TW;
Shawn Yang, Hsin-Chu, TW;
Szu-Hsien Lo, Hsin-Chu, TW;
Shuen-Liang Tseng, Hsinchu, TW;
Wen-Cheng Cheng, Hsinchu, TW;
Chen-Fang Chung, Zhubei, TW;
Chia-Lin Hsueh, Zhubei, TW;
Kuo-Pin Chuang, Xinfeng Township, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A method for modifying magnetic field distribution in a deposition chamber is disclosed. The method includes the steps of providing a target magnetic field distribution, removing a first plurality of fixed magnets in the deposition chamber, replacing each of the first plurality of fixed magnets with respective ones of a second plurality of magnets, performing at least one of adjusting a position of at least one of the second plurality of the magnets, and adjusting a size of at least one of the second plurality of magnets, adjusting a magnetic flux of at least one of the second plurality of magnets, measuring the magnetic field distribution in the deposition chamber, and comparing the measured magnetic field distribution in the deposition chamber with the target magnetic field distribution.