Kun-Huan Shih

Title: Innovations by Kun-Huan Shih: A Trailblazer in Transistor Design

Introduction

Kun-Huan Shih is a notable inventor based in Portland, Oregon, who has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, his innovative designs focus primarily on advancements in transistor architecture, enhancing the performance and efficiency of modern electronic devices.

Latest Patents

Kun-Huan Shih's recent patents showcase his cutting-edge expertise in low capacitance applications and vertical transistor technologies.

1. **Asymmetric Spacer for Low Capacitance Applications**: This patent describes an apparatus that features a transistor inclusive of a source, drain, and gate with first and second sidewalls. The invention incorporates a first spacer on the first sidewall between the drain and the gate, a second spacer on the second sidewall between the source and the gate, and an innovative third spacer on the first spacer to enhance functionality and efficiency.

2. **Vertical Transistor Using a Through Silicon Via Gate**: This patent details a vertical transistor design that utilizes a through silicon via as its gate. The structure involves a substrate with a via filled with conductive material and a dielectric liner, coupled to a deep well and drain areas. The source area is situated between the drain and the via, featuring a source contact, while a gate contact is located over the via, outlining a novel approach to transistor configuration.

Career Highlights

Kun-Huan Shih has established himself at Intel Corporation, a leading technology company known for its pioneering innovations in semiconductor design and manufacturing. His work at Intel has allowed him to leverage cutting-edge technology and collaborate with some of the brightest minds in the industry.

Collaborations

Throughout his career, Kun-Huan has collaborated with esteemed colleagues such as Jui-Yen Lin and Walid M Hafez. These collaborations have proven to be influential in furthering his research and development efforts, driving technological advancements in transistor design and functionality.

Conclusion

Kun-Huan Shih's innovative contributions to the field of semiconductor technology, particularly in transistor design, reflect his dedication to advancing electronic efficiencies. With a track record of successful patents and collaborations at a renowned organization like Intel Corporation, Shih continues to be a significant figure in the evolution of electronic devices. His work not only pushes the boundaries of innovation but also paves the way for future advancements in the industry.