Company Filing History:
Years Active: 2022-2025
Title: Ku-Hsiang Sung: Innovator in Semiconductor Cleaning Technologies
Introduction
Ku-Hsiang Sung is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of substrate cleaning technologies. With a total of 3 patents to his name, his work has been instrumental in advancing the efficiency and effectiveness of semiconductor device production.
Latest Patents
One of Ku-Hsiang Sung's latest patents is a method and device for cleaning substrates. In this innovative approach, a semiconductor wafer is retrieved from a load port and transferred to a treatment device. Within this device, the surface of the semiconductor wafer is exposed to a directional stream of plasma wind, which effectively cleans particles from the wafer's surface. The plasma wind is generated by an ambient plasma generator and is directed at an oblique angle relative to a perpendicular plane to the wafer's surface for a predetermined plasma exposure time. Following the cleaning process, a photo resist layer is applied to the semiconductor wafer, enhancing the overall manufacturing process.
Career Highlights
Ku-Hsiang Sung has established himself as a key figure in the semiconductor industry through his innovative patents and contributions. His work at Taiwan Semiconductor Manufacturing Company Ltd. has positioned him at the forefront of semiconductor technology advancements. His expertise in cleaning methods has led to improved manufacturing processes, benefiting the industry as a whole.
Collaborations
Throughout his career, Ku-Hsiang Sung has collaborated with talented individuals such as Chung-Hsuan Liu and Chen-Yang Lin. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies in semiconductor manufacturing.
Conclusion
In summary, Ku-Hsiang Sung is a prominent inventor whose work in semiconductor cleaning technologies has made a significant impact on the industry. His innovative methods and collaborative efforts continue to drive advancements in semiconductor manufacturing.
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