Kawasaki, Japan

Kouta Yoshikawa

This inventor holds 4 USPTO granted patents and 1 EPO patent. Top assignee: Fujitsu Corporation. Active years: 2012-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kouta Yoshikawa. Retrieved from https://idiyas.com/inventor/kouta-yoshikawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2012-2014

Loading Chart...
Loading Chart...
4 patents (USPTO):Explore Patents

Title: Kouta Yoshikawa: Innovator in Semiconductor Technology

Introduction

Kouta Yoshikawa is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving the manufacturing processes and materials used in semiconductor devices.

Latest Patents

Yoshikawa's latest patents include innovative solutions such as an agent for post-etch treatment of silicon dielectric film and a method of manufacturing semiconductor devices. The first invention provides an agent for post-etch treating a silicon dielectric film, which includes at least one nitrogen-containing substance selected from ammonium bases and amine compounds, an acid, and at least one silicon-containing compound containing silicon, carbon, and hydrogen. This invention effectively suppresses the increase in the dielectric constant of a silicon dielectric film caused by etching. Another notable patent involves a process for producing a silicic coating, which results in a silicic coating of 2.4 g/cm or higher density. This coating is formed using at least one type of silane compound with a photosensitive functional group and is subsequently irradiated with light. This silicic coating can serve as a novel barrier film or stopper film for semiconductor devices.

Career Highlights

Kouta Yoshikawa is currently employed at Fujitsu Corporation, where he continues to advance semiconductor technology. His work has been instrumental in developing new materials and processes that enhance the performance and reliability of semiconductor devices.

Collaborations

Yoshikawa has collaborated with notable colleagues in his field, including Tadahiro Imada and Yoshihiro Nakata. These collaborations have contributed to the successful development of his innovative patents.

Conclusion

Kouta Yoshikawa is a key figure in the semiconductor industry, with a focus on enhancing manufacturing processes and materials. His contributions through his patents reflect his commitment to innovation and excellence in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…