Tokyo, Japan

Kousuke Miyoshi


Average Co-Inventor Count = 1.4

ph-index = 3

Forward Citations = 77(Granted Patents)


Company Filing History:


Years Active: 1997-2002

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5 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Kousuke Miyoshi in Semiconductor Technology**

Introduction

Kousuke Miyoshi, an accomplished inventor based in Tokyo, Japan, has made significant strides in the semiconductor industry. With a total of five patents to his name, his expertise and innovative methods are instrumental in advancing semiconductor technology.

Latest Patents

Miyoshi's latest innovations include two notable patents. The first patent is focused on a method of forming shallow trench isolation (STI), which outlines a meticulous process involving several steps. These steps comprise forming a mask pattern on a silicon substrate, creating a trench using the mask, and layering silicon dioxide films strategically to achieve the desired isolation without compromising the integrity of the substrate. This method enhances performance in semiconductor devices, ensuring they operate efficiently.

The second patent pertains to thermal processing of semiconductor devices. This invention addresses the challenge of achieving smaller leakage currents in devices that have undergone ion implantation. By employing a precise heating process at high temperatures, Miyoshi’s method ensures that the resulting semiconductor devices exhibit minimal leakage and improved operational consistency.

Career Highlights

Kousuke Miyoshi currently works at NEC Corporation, a leading player in the global semiconductor industry. His role at the company allows him to collaborate on cutting-edge technologies that are shaping the future of electronics. His contributions in the realm of semiconductor fabrication showcase his dedication to the field and his commitment to driving innovation.

Collaborations

Miyoshi has had the opportunity to work alongside esteemed colleagues such as Seiichi Shishiguchi and Toshiya Hayashi. Their collaborations have undoubtedly fostered a creative environment that encourages the development of groundbreaking technologies and patents, contributing to the success of NEC Corporation.

Conclusion

Kousuke Miyoshi exemplifies the spirit of innovation within the semiconductor industry. Through his groundbreaking patents and collaborations, he continues to push the boundaries of what is possible. His work not only impacts the field of semiconductor technology but also inspires future generations of inventors and engineers.

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