The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 1997
Filed:
Aug. 17, 1994
Applicant:
Inventor:
Kousuke Miyoshi, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H / ;
U.S. Cl.
CPC ...
156345 ; 20429831 ;
Abstract
An apparatus for dry etching includes a vacuum chamber into which an etching gas is to be introduced, an electrode disposed in the vacuum chamber, a material to be etched being placed on an upper surface of the electrode, at least one cylindrical ring disposed around the material, and a device for raising and lowering the rings so that the rings are raised above or lowered below the upper surface of the electrode.