Company Filing History:
2 out of 10,341 
2 out of 85 
Years Active: 1994-1996
Title: Kouichi Tanoue: Innovator in Substrate Scrubbing Technology
Introduction
Kouichi Tanoue is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate scrubbing and cleaning technology. With a total of 2 patents, his work focuses on improving the efficiency and effectiveness of cleaning processes for substrates, particularly in the electronics industry.
Latest Patents
Tanoue's latest patents include a "Method for Scrubbing and Cleaning Substrate" and a "Device and Method for Scrubbing and Cleaning Substrate." The first patent describes a method where a substrate is carried to a rotatable scrubbing arrangement. Both surfaces of the substrate are scrubbed while maintaining a substantially horizontal position. Additionally, a cleaning solution is applied to both surfaces during this process. The second patent outlines a device that features upper and lower brush members designed for scrubbing LCD glass substrates. This device includes mechanisms for rotating the brushes, supplying pure water, and carrying the substrate for effective cleaning.
Career Highlights
Throughout his career, Kouichi Tanoue has worked with prominent companies such as Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His experience in these organizations has allowed him to develop and refine his innovative cleaning technologies.
Collaborations
Tanoue has collaborated with notable coworkers, including Shinzi Kitamura and Noriyuki Anai. Their combined expertise has contributed to advancements in substrate cleaning methods and devices.
Conclusion
Kouichi Tanoue's contributions to substrate scrubbing technology highlight his innovative spirit and dedication to improving cleaning processes in the electronics industry. His patents reflect a commitment to enhancing efficiency and effectiveness in substrate maintenance.