Tokyo Electron Limited

Tokyo Electron Kyushu Limited

Kouichi Tanoue

Noriyuki Anai

Takami Satoh

Tatsuya Iwasaki

Takayuki Tomoeda

Kengo Mizosaki

Shinzi Kitamura

A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solution is applied to both surfaces of the substrate while the substrate is substantially horizontal and is linearly reciprocated.

Method for scrubbing and cleaning substrate

A substrate scrubbing and cleaning device comprising a mechanism having an upper and a lower brush members for scrubbing both surfaces of an LCD glass substrate, a mechanism for rotating the upper and lower brush members, a mechanism for supplying pure water to the upper and lower brush members, a mechanism for carrying the substrate between the upper and the lower brush members to reciprocate it relative to the upper and lower brush members in a substrate carrying direction, and a controller for controlling the operation of the substrate carrying mechanism.

Device and method for scrubbing and cleaning substrate

Growing community of inventors

Kumamoto, Japan

Kouichi Tanoue