The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 1996
Filed:
Jun. 29, 1994
Applicant:
Inventors:
Kouichi Tanoue, Kumamoto, JP;
Shinzi Kitamura, Kumamoto, JP;
Noriyuki Anai, Kumamoto, JP;
Takami Satoh, Kumamoto, JP;
Takayuki Tomoeda, Kumamoto, JP;
Tatsuya Iwasaki, Kumamoto, JP;
Kengo Mizosaki, Kumamoto, JP;
Assignees:
Tokyo Electron Limited, Tokyo, JP;
Tokyo Electron Kyushu Limited, Tosu, JP;
Primary Examiner:
Int. Cl.
CPC ...
B08B / ; B08B / ; B08B / ; B08B / ;
U.S. Cl.
CPC ...
134-1 ; 134-7 ; 134-6 ; 134 26 ; 134 32 ; 134 33 ;
Abstract
A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solution is applied to both surfaces of the substrate while the substrate is substantially horizontal and is linearly reciprocated.