Fukushima, Japan

Kouichi Tanaka

This inventor holds 6 USPTO granted patents. Top assignee: Shin-Etsu Handotai Co., Ltd.. Active years: 1992-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kouichi Tanaka. Retrieved from https://idiyas.com/inventor/kouichi-tanaka-9a4djcrg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 6

Forward Citations = 226(Granted Patents)


Location History:

  • Takasaki, JP (1992)
  • Nishigo-mura, JP (1996)
  • Fukushima-ken, JP (1996 - 1997)
  • Nishigou-mura, JP (1998)
  • Nishishiraka-gun, JP (2002)

Company Filing History:


Years Active: 1992-2002

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6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Kouichi Tanaka

Introduction

Kouichi Tanaka, an accomplished inventor from Fukushima-ken, Japan, has made significant strides in the field of material engineering and polishing technologies. With a total of six patents to his name, Tanaka's work has revolutionized the processes involved in wafer polishing and workpiece holder design.

Latest Patents

Among Tanaka's latest patents are innovations such as a workpiece holder for polishing, a method for producing the same, and a polishing apparatus. His inventive approach enhances the material used for the workpiece holder's body, allowing it to hold workpieces via vacuum adsorption while improving the quality of the resin coating on the surface. This innovation ensures precision in workpiece holding while preventing the blocking of perforated holes during the coating process. His work notably features a polished holding surface that utilizes a thermosetting resin, yielding a high-precision workpiece holder. Additionally, Tanaka has developed a process for polishing silicon wafers that optimizes traditional methods. By employing a two-step polishing process—comprising a primary and final polishing step—Tanaka's method achieves quality results comparable to older three-step methods, all while streamlining production efficiency.

Career Highlights

Kouichi Tanaka's career has been marked by continuous innovation and contributions to highly technical domains, particularly at Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His expertise in refining wafer polishing techniques demonstrates his commitment to enhancing manufacturing processes in technology sectors.

Collaborations

Throughout his career, Tanaka has collaborated with esteemed colleagues such as Fumio Suzuki and Hiromasa Hashimoto, further strengthening the impact of his work. These partnerships have fostered an environment of shared knowledge and innovation, allowing for the development of advanced technologies that benefit the entire industry.

Conclusion

Kouichi Tanaka remains a notable figure in the field of innovations related to polishing technologies and workpiece holders. His patents exemplify a dedication to improving precision and efficiency in manufacturing processes, with a profound influence on the semiconductor industry. As technology evolves, Tanaka's contributions continue to pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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