Location History:
- Takasaki, JP (1992)
- Nishigo-mura, JP (1996)
- Fukushima-ken, JP (1996 - 1997)
- Nishigou-mura, JP (1998)
- Nishishiraka-gun, JP (2002)
Company Filing History:
Years Active: 1992-2002
Title: The Innovative Contributions of Kouichi Tanaka
Introduction
Kouichi Tanaka, an accomplished inventor from Fukushima-ken, Japan, has made significant strides in the field of material engineering and polishing technologies. With a total of six patents to his name, Tanaka's work has revolutionized the processes involved in wafer polishing and workpiece holder design.
Latest Patents
Among Tanaka's latest patents are innovations such as a workpiece holder for polishing, a method for producing the same, and a polishing apparatus. His inventive approach enhances the material used for the workpiece holder's body, allowing it to hold workpieces via vacuum adsorption while improving the quality of the resin coating on the surface. This innovation ensures precision in workpiece holding while preventing the blocking of perforated holes during the coating process. His work notably features a polished holding surface that utilizes a thermosetting resin, yielding a high-precision workpiece holder. Additionally, Tanaka has developed a process for polishing silicon wafers that optimizes traditional methods. By employing a two-step polishing process—comprising a primary and final polishing step—Tanaka's method achieves quality results comparable to older three-step methods, all while streamlining production efficiency.
Career Highlights
Kouichi Tanaka's career has been marked by continuous innovation and contributions to highly technical domains, particularly at Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His expertise in refining wafer polishing techniques demonstrates his commitment to enhancing manufacturing processes in technology sectors.
Collaborations
Throughout his career, Tanaka has collaborated with esteemed colleagues such as Fumio Suzuki and Hiromasa Hashimoto, further strengthening the impact of his work. These partnerships have fostered an environment of shared knowledge and innovation, allowing for the development of advanced technologies that benefit the entire industry.
Conclusion
Kouichi Tanaka remains a notable figure in the field of innovations related to polishing technologies and workpiece holders. His patents exemplify a dedication to improving precision and efficiency in manufacturing processes, with a profound influence on the semiconductor industry. As technology evolves, Tanaka's contributions continue to pave the way for future advancements.