The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 1992
Filed:
Jan. 22, 1991
Kouichi Tanaka, Takasaki, JP;
Isao Uchiyama, Nishigo, JP;
Shin-Etsu Handotai Company, Ltd., Tokyo, JP;
Abstract
A polishing apparatus for polishing an object to be polished at a high flatness includes at least one plate with at least one object to be polished secured at an underside thereof, a head section surrounding the plate with a predetermined gap therebetween, a pressure applying device for applying a pressing force to the top of the plate, and a holding device for holding the plate in the plane of the polishing movement of the object to be polished. The pressure applying device and the holding device are both disposed in an inner space of the head section, the latter being movable perpendicular to the plane of the polishing movement. The attaching position of the holding device on the outer surface of the plate is set substantially at the same height as or at a position lower than the attaching position of the holding device on the inner surface of the head section. The intersecting point of the imaginary lines through the fixing positions of the holding device on the head section and those corresponding to them on the plate substantially lies on or at a position lower than the polishing surface of the object to be polished.