Joetsu, Japan

Kouhei Sasamoto

USPTO Granted Patents = 23 

 

Average Co-Inventor Count = 2.5

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Niigata, JP (2015 - 2018)
  • Joetsu, JP (2016 - 2024)

Company Filing History:


Years Active: 2015-2025

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23 patents (USPTO):

Title: **Innovative Contributions of Kouhei Sasamoto in Photomask Technology**

Introduction

Kouhei Sasamoto, an accomplished inventor from Joetsu, Japan, has made significant strides in the field of photomask technology, holding a total of 22 patents. His work focuses on enhancing the production methods and materials used in photomasks, which are critical components in the semiconductor manufacturing process.

Latest Patents

Among his latest innovations, the patents related to photomask blanks and their production methods stand out. One notable invention offers a photomask blank that showcases high adhesion of a resist film to a film containing chromium. This innovation is designed to achieve remarkable resolution limits and excellent critical dimension (CD) linearity while forming an assist pattern that supplements the main pattern on the photomask. His patents include a complex layering structure that optimizes the compositions of oxygen, nitrogen, chromium, and carbon, thus enhancing the performance of photomasks in various applications.

Career Highlights

Kouhei Sasamoto is affiliated with Shin-etsu Chemical Co., Ltd., a company renowned for its contributions to materials used in semiconductor fabrication. His career in this innovative environment has allowed him to push the boundaries of photomask technology, promoting advancements that benefit the broader electronics industry.

Collaborations

In his efforts, he has collaborated with esteemed colleagues such as Yukio Inazuki and Souichi Fukaya, among others. These collaborations are vital, as they bring together diverse expertise and perspectives, enhancing the innovation process and leading to noteworthy advancements in photomask technology.

Conclusion

Kouhei Sasamoto's contributions to photomask technology exemplify the critical role of inventors in advancing industry standards. His patents reflect a deep understanding of materials and their interactions, paving the way for future innovations in the semiconductor sector. As he continues to broaden the horizons of this essential technology, Sasamoto remains a pivotal figure in the ongoing evolution of semiconductor manufacturing.

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