The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Aug. 17, 2016
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Kouhei Sasamoto, Joetsu, JP;
Yukio Inazuki, Joetsu, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
A photomask blank comprising a transparent substrate and a chromium-containing film is provided. The chromium-containing film is constructed by one or more chromium compound layers which are formed of a chromium compound containing Cr, N and optionally O, and have a composition having a Cr content ≧30 at % and a total Cr+N+O content ≧93 at %, and meeting the formula: 3Cr≦2O+3N. A chromium compound layer meeting a first composition having an N/Cr atomic ratio ≧0.95, a Cr content ≧40 at %, a total Cr+N content ≧80 at %, and an O content ≦10 at % is included to a thickness of more than 70% to 100% of the overall thickness of the chromium-containing film.