The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Aug. 17, 2016
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventor:
Kouhei Sasamoto, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/50 (2012.01); G03F 1/38 (2012.01); G03F 1/32 (2012.01); G03F 1/20 (2012.01); G03F 1/26 (2012.01); G03F 1/80 (2012.01);
U.S. Cl.
CPC ...
G03F 1/32 (2013.01); G03F 1/20 (2013.01); G03F 1/26 (2013.01); G03F 1/80 (2013.01);
Abstract
A photomask blank comprising a transparent substrate and a chromium-containing film is provided. The chromium-containing film is formed of a chromium compound containing Cr, N, and optionally O, has a total Cr+N+O content≧93 at %, and meets the formula: 3Cr≧2O+3N. A chromium compound layer meeting a first composition having a N/Cr atomic ratio≧0.95, a Cr content ≧40 at %, a Cr+N content≧80 at %, and an O content≧10 at % accounts for 10-70% of the overall thickness of the chromium-containing film.