Kosuke Kariu

Title: Innovations of Kosuke Kariu

Introduction

Kosuke Kariu is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His work focuses on methods that enhance the etching processes of organic films and silicon materials.

Latest Patents

One of Kariu's latest patents is a method of etching organic film. This innovative technique allows for the etching of organic films while minimizing damage to the underlying layers. The process involves using a plasma processing apparatus where a processing gas containing hydrogen and nitrogen is supplied. The flow rate ratio of hydrogen gas is carefully controlled, and a high-frequency bias power is applied to attract ions to the processing target object.

Another significant patent is an etching method that selectively etches silicon oxide regions in a target object compared to silicon regions. This method utilizes plasma generated from a first processing gas containing fluorocarbon and fluorohydrocarbon, followed by processing with a second gas containing fluorocarbon. This dual-step approach enhances precision in etching.

Career Highlights

Kosuke Kariu is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop and refine his innovative etching methods, contributing to advancements in semiconductor technology.

Collaborations

Kariu collaborates with talented coworkers, including Hiroto Ohtake and Toshihisa Ozu. Their combined expertise fosters a creative environment that drives innovation in their projects.

Conclusion

Kosuke Kariu's contributions to plasma processing technology and etching methods demonstrate his commitment to innovation in the semiconductor field. His patents reflect a deep understanding of the complexities involved in material processing, paving the way for future advancements.