Shizuoka, Japan

Koji Shirakawa

This inventor holds 20 USPTO granted patents and 3 published patent applications and 5 EPO patents, primarily in Photoresist Technology. Top assignees: Fuji Photo Film Company, Limited, Fujifilm Corporation. Active years: 1997-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koji Shirakawa. Retrieved from https://idiyas.com/inventor/koji-shirakawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 85.0

 

Average Co-Inventor Count = 2.9

ph-index = 6

Forward Citations = 87(Granted Patents)


Location History:

  • Haibara-gun, JP (2004 - 2014)
  • Shizuoka, JP (1997 - 2015)

Company Filing History:


Years Active: 1997-2015

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Areas of Expertise:
Chemical Amplification Resist
Negative Resist Composition
Positive Resist Composition
Pattern Forming Method
EUV Rays
Electron Beams
Developer
Image Forming Method
Strippable Layer
Radiation-Sensitive Resin
Alkali Soluble Resins
Multiple Development
20 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Koji Shirakawa

Introduction: Koji Shirakawa is a prominent inventor based in Shizuoka, Japan, with an impressive portfolio of 20 patents to his name. His work has significantly advanced the fields of chemical amplification and resist compositions, impacting various technology sectors.

Latest Patents: Among his latest patents, two stand out for their innovative approaches. The first is a patent for a chemical amplification resist composition, along with a mold preparation method and a resist film utilizing this composition. This invention has been essential for preparing molds in various applications. The second patent covers a negative resist composition, which consists of an alkali-soluble polymer, a crosslinking agent, an acid-generating compound, a specific quaternary ammonium salt, and an organic carboxylic acid. This composition also includes a defined pattern-forming method, showcasing its versatility and practicality in advanced manufacturing processes.

Career Highlights: Koji Shirakawa has built his career through significant contributions during his tenure at notable companies such as Fuji Photo Film Company, Limited, and Fujifilm Corporation. His work at these organizations has allowed him to refine his expertise in chemical compositions and materials, driving innovation in the industry.

Collaborations: Throughout his career, Shirakawa has collaborated with talented individuals like Shoichiro Yasunami and Yutaka Adegawa. These collaborations have often resulted in groundbreaking advancements and efficient methodologies that have pushed the boundaries of technology.

Conclusion: Koji Shirakawa's inventions and patents reflect his dedication to innovation in his field. His contributions not only enhance the understanding of chemical amplification and resist compositions but also pave the way for future developments in technology. With 20 patents to his name, Shirakawa remains a significant figure in the realm of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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