The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2015
Filed:
Apr. 17, 2014
Applicant:
Fujifilm Corporation, Minato-Ku, Tokyo, JP;
Inventors:
Koji Shirakawa, Shizuoka, JP;
Tadateru Yatsuo, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01); G03F 7/11 (2006.01); H01L 21/027 (2006.01); H01L 21/32 (2006.01); H01L 21/311 (2006.01); C09D 125/18 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); H01L 21/0274 (2013.01); H01L 21/32 (2013.01); H01L 21/31144 (2013.01); C09D 125/18 (2013.01); G03F 7/0382 (2013.01); Y10S 430/143 (2013.01);
Abstract
A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.