The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Jan. 29, 2010
Toru Tsuchihashi, Shizuoka, JP;
Tadateru Yatsuo, Shizuoka, JP;
Koji Shirakawa, Shizuoka, JP;
Hideaki Tsubaki, Shizuoka, JP;
Akira Asano, Shizuoka, JP;
Toru Tsuchihashi, Shizuoka, JP;
Tadateru Yatsuo, Shizuoka, JP;
Koji Shirakawa, Shizuoka, JP;
Hideaki Tsubaki, Shizuoka, JP;
Akira Asano, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A resist pattern forming method including in the following order, (1) a step of forming a film by using a negative chemical-amplification resist composition capable of undergoing negative conversion by a crosslinking reaction, (2) a step of exposing the film, and (4) a step of developing the exposed film by using a developer containing an organic solvent; a developer and a negative chemical-amplification resist composition used therefor; and a resist pattern formed by the pattern forming method.