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For the Inventor, By the Inventor

Annaka, Japan

Koji Mizuishi

This inventor holds 13 USPTO granted patents. Top assignee: Shin-Etsu Handotai Co., Ltd.. Active years: 1991-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koji Mizuishi. Retrieved from https://idiyas.com/inventor/koji-mizuishi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 13

% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 6

Forward Citations = 92(Granted Patents)


Location History:

  • Gunma, JP (1995)
  • Gunma-ken, JP (1997 - 1998)
  • Annaka, JP (1991 - 1999)
  • Fukushima, JP (2003)

Company Filing History:

goldMedal13 out of 1,099 
 
Shin-Etsu Handotai Co., Ltd.
 patents

Years Active: 1991-2003

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13 patents (USPTO):Explore Patents
1. 6605152 - Catch pan for melt leakage in apparatus for pulling single crystal (2003-08-12),
2. 5900055 - Method of manufacturing silicon monocrystal by continuously charged (1999-05-04),
3. 5735951 - Single crystal pulling apparatus (1998-04-07),
4. 5667588 - Single crystal pulling apparatus (1997-09-16),
5. 5462010 - Apparatus for supplying granular raw material for a semiconductor single (1995-10-31),
6. 5394829 - Device for pulling silicon single crystal (1995-03-07),
7. 5356113 - Isolation valve for single crystal pulling apparatus (1994-10-18),
8. 5330729 - Single crystal pulling apparatus (1994-07-19),
9. 5254319 - Single crystal pulling apparatus (1993-10-19),
10. 5106593 - Apparatus for producing Czochralski-grown single crystals (1992-04-21),
11. 5096677 - Single crystal pulling apparatus (1992-03-17),
12. 5089239 - Wire vibration prevention mechanism for a single crystal pulling (1992-02-18),
13. 5020775 - Isolation valve used in a single crystal pulling apparatus (1991-06-04),

Title: Koji Mizuishi: Innovator in Silicon Monocrystal Technology

Introduction

Koji Mizuishi is a prominent inventor based in Annaka, Japan, known for his significant contributions to the field of silicon monocrystal technology. With a total of 13 patents to his name, Mizuishi has made remarkable advancements that enhance the efficiency and safety of single crystal pulling apparatuses.

Latest Patents

Mizuishi's latest patents include innovative designs such as a catch pan for melt leakage in apparatuses for pulling single crystals. This invention provides a catch pan situated under a crucible in a single crystal pulling apparatus, effectively preventing melt leakage from reaching lower mechanisms and protecting operators and equipment. Another notable patent is a method for manufacturing silicon monocrystals using a continuously charged Czochralski method. This method employs a double crucible system that allows for precise control of dopant concentrations, ensuring the desired electrical properties of the silicon monocrystal.

Career Highlights

Mizuishi is currently employed at Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His work focuses on improving the processes involved in silicon crystal growth, which is crucial for the production of high-quality semiconductor materials.

Collaborations

Throughout his career, Mizuishi has collaborated with esteemed colleagues such as Michiaki Oda and Hirotoshi Yamagishi. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Koji Mizuishi's contributions to silicon monocrystal technology have significantly impacted the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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