Location History:
- Kyoto, JP (2015 - 2019)
- Mie, JP (2020)
Company Filing History:
7 out of 309 
3 out of 23 Years Active: 2015-2020
Title: The Innovative Contributions of Koichi Yoshida in Polishing Technology
Introduction
Koichi Yoshida, an esteemed inventor based in Kyoto, Japan, has made significant advancements in the field of polishing technology. With a total of seven patents to his name, Yoshida's work demonstrates a commitment to enhancing the efficiency and effectiveness of chemical mechanical planarization processes.
Latest Patents
Among his latest inventions, Yoshida has developed an aqueous composition of low dishing silica particles for polysilicon polishing. This innovative formula includes a mixture of alkoxylated diamines, aqueous dispersions of silica particles, and ammonia or amine base, all while maintaining a pH level between 9 and 11. The compositions are designed to be free of damaging metals, ensuring substrate integrity during the polishing process. Another notable patent involves a tapering method for creating poromeric polishing pads. This method allows for the formation of a porous polyurethane polishing pad with interconnected large and small pores, improving the overall performance in polishing applications.
Career Highlights
Throughout his career, Yoshida has held pivotal roles at notable companies in the semiconductor industry. He has worked with Rohm and Haas Electronic Materials CMP Holdings, Inc. and Nitta Haas Inc., where he contributed to advancing polishing processes critical for the production of high-quality semiconductor materials.
Collaborations
In his innovative journey, Yoshida has collaborated with esteemed colleagues, including Katsumasa Kawabata and Kazutaka Miyamoto. Their joint efforts have contributed significantly to the development of polishing technologies and high-performance materials.
Conclusion
Koichi Yoshida's contributions to polishing technology through his patents highlight the importance of innovation in improving manufacturing processes. His work not only enhances the performance of semiconductor materials but also showcases the impact of collaboration and advanced research in driving technological progress.