Kohichiro Eshima

Kohichiro Eshima is a notable inventor based in Honjo, Japan. He has made significant contributions to the field of materials science, particularly in the development of tin-containing indium oxides. With a total of 3 patents to his name, Eshima's work has implications for various applications in electronics and coatings.

Latest Patents

Eshima's latest patents include innovative processes and materials. One of his patents focuses on tin-containing indium oxides, detailing a process for producing them, a coating solution utilizing these materials, and electrically conductive coatings formed from them. This patent describes a Sn-containing In oxide in the form of needles or plates, comprising particles with a major axis of 0.1 µm or less and a minor axis of 0.05 µm or less. Another significant patent involves sintered ITO and an ITO sputtering target. This invention features sintered ITO with a relative density of at least 88% and an oxygen content of 15.5-17.0 wt %. The ITO sputtering target made from this sintered ITO allows for an optimal range of oxygen in a mixture of argon and oxygen gases, enhancing the consistent formation of ITO films.

Career Highlights

Kohichiro Eshima is associated with Dowa Mining Co., Ltd., where he continues to innovate in the field of materials. His work has been instrumental in advancing the technology surrounding indium oxides, which are critical for various electronic applications.

Collaborations

Eshima has collaborated with notable colleagues, including Kouki Toishi and Katsuaki Okabe. Their combined expertise has contributed to the successful development of new materials and processes.

Conclusion

Kohichiro Eshima's contributions to the field of materials science, particularly through his patents on tin-containing indium oxides, highlight his role as an influential inventor. His work continues to impact the electronics industry and pave the way for future innovations.