The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2000
Filed:
Oct. 02, 1997
Applicant:
Inventors:
Kohichiro Eshima, Honjo, JP;
Kouki Toishi, Honjo, JP;
Katsuaki Okabe, Honjo, JP;
Tsuyoshi Nishimura, Honjo, JP;
Shinji Sato, Omonogawa-machi, JP;
Choju Nagata, Honjo, JP;
Assignee:
Dowa Mining Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C04B / ; C23C / ; C23C / ;
U.S. Cl.
CPC ...
501126 ; 501134 ; 20419226 ; 20419229 ; 20429813 ;
Abstract
Sintered ITO having a relative density of at least 88% and an oxygen content of 15.5-17.0 wt %, as well as an ITO sputtering target made of this sintered ITO. Using the target, an optimal range for the proportion of oxygen in a mixture of argon and oxygen gases used as a sputtering atmosphere is sufficiently expanded to permit the consistent formation of ITO films.